Advanced Manufacturing

17. Ultrathin 3D-structured Cu/CNT current collector with lithiphilicity gradient for high-performance anode-free Li-metal battery anodes

Inyeong Yang, Dongyeon Won, Sukkyung Kang, Hyunwoong Baek, Sanha Kim, submitted

17. Ultrathin 3D-structured Cu/CNT current collector with lithiphilicity gradient for high-performance anode-free Li-metal battery anodes

16. Carbon nanotube sandpaper for atomic-precision surface finishing

Sukkyung Kang, Ji-hun Jeong, Hyun Jun Ryu, Gunhoo Park, Sanha Kim, submitted

16. Carbon nanotube sandpaper for atomic-precision surface finishing

15. An ionic gelation powder for ultrafast hemostasis and accelerated wound healing

Youngju Son, Kyusoon Pak, Taehoon Lee, Monica Celine Prayogo, Jinyoung Choi, Sukkyung Kang, Minjoo Kang, Byungkook Oh, Sang Yu Sun, Sanha Kim, Sung Gap Im, Sangyong Jon, Steve Park, submitted

15. An ionic gelation powder for ultrafast hemostasis and accelerated wound healing

14. Challenges and innovations in chemical mechanical polishing in the More-than-Moore Era

Hyeongmin Je#, Sukkyung Kang#, Sanha Kim, under review

14. Challenges and innovations in chemical mechanical polishing in the More-than-Moore Era

13. Modeling framework and discussion of microstructural effects on the formation of Cu–Cu bonding interfaces in semiconductor stacking

Jae-Uk Lee, Hyun-Dong Lee, Sung-Hyun Oh, Young-Dae Shim, Sukkyung Kang, Sanha Kim, Hoo-Jeong Lee, Eun-Ho Lee, under review

13. Modeling framework and discussion of microstructural effects on the formation of Cu–Cu bonding interfaces in semiconductor stacking

12. Chemical mechanical polishing of plasma-modified Cu/polymer interfaces for advanced hybrid bonding

Sukkyung Kang#, Chansu Jeon#, Juseong Park, Seulah Park, Kyung Min Kim, Sanha Kim, under review

12. Chemical mechanical polishing of plasma-modified Cu/polymer interfaces for advanced hybrid bonding

11. Mitigation of Cu Dishing in Chemical Mechanical Polishing using Micro-Structured Pads

Seulah Park#, Sukkyung Kang#, Dong-Geun Kim#, Sanha Kim, CIRP Annals - Manufacturing Technology, 2025, accepted.

11. Mitigation of Cu Dishing in Chemical Mechanical Polishing using Micro-Structured Pads

10. Frequency-comb-referenced Terahertz Fabry-Pérot interferometry for monitoring semiconductor wafer thinning process with a nanometer precision

Guseon Kang, Jaeyoon Kim, Jun Hyung Park, Sukkyung Kang, Dong Geun Kim, Young Jin Kim, CIRP Annals - Manufacturing Technology, 2025, accepted.

10. Frequency-comb-referenced Terahertz Fabry-Pérot interferometry for monitoring semiconductor wafer thinning process with a nanometer precision

9. Characteristics of PVD SiCN for Application in Hybrid Cu Bonding

Junyoung Choi, Suin Jang, Dongmyeong Lee, Sukkyung Kang, Sanha Kim, Sarah Eunkyung Kim, Journal of Semiconductor Technology and Science, 25, 1, 102, 2025.

9. Characteristics of PVD SiCN for Application in Hybrid Cu Bonding

8. Nanometer-resolution white-light scanning interferometry for surface-profiling of hybrid bonding samples for advanced semiconductor packaging

Huy Hoang Chu#, Dae Hee Kim#, Jun Hyung Park, Sukkyung Kang, Jaiho Son, Hyunmin Lee, Hongki Yoo, Seung-Woo Kim, Sanha Kim, Young-Jin Kim, Applied Surface Science, 689, 162466, 2025.

8. Nanometer-resolution white-light scanning interferometry for surface-profiling of hybrid bonding samples for advanced semiconductor packaging